Preparation and Characterisation of Pyrolytically-Deposited Thin Oxide Films from Metal-Organic Compounds

Preparation and Characterisation of Pyrolytically-Deposited Thin Oxide Films from Metal-Organic Compounds

A simple and versatile pyrolytic method of preparing thin metal oxide films that is based on the Metal Organic Chemical Vapour Deposition (MOCVD) technique and that is operative at relatively low temperatures (420°C) has been utilised to prepare the thin metal oxide films of indium, zinc, aluminium...

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Bibliográfalaš dieđut
Váldodahkki:	Lambi, John Ngolui
Eará dahkkit:	Ajayi, O.B.
Materiálatiipa:	Oahppočájánas
Giella:	eaŋgalasgiella
Almmustuhtton:	Obafemi Awolowo University 2014
Fáttát:	Organic metal pyrolytic carboxylic acid stoichiometry scanning electron microscopy (SEM)
Liŋkkat:	http://localhost:8080/xmlui/handle/123456789/3442
Fáddágilkorat:	Lasit fáddágilkoriid Eai fáddágilkorat, Lasit vuosttaš fáddágilkora!

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