Deep level transient spectroscopy study of the damage induced in n-type silicon by a gate oxide etching in a CHF3/Ar plasma
International Journal of vacuum science & technology B 15(3):623 - 628
Furkejuvvon:
| Váldodahkkit: | , , , |
|---|---|
| Materiálatiipa: | Áigečála |
| Giella: | eaŋgalasgiella |
| Almmustuhtton: |
Journal of vacuum science & technology B
2020
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| Fáttát: | |
| Liŋkkat: | https://ir.oauife.edu.ng/handle/123456789/5091 |
| Fáddágilkorat: |
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